For example, there is a desire for resist compositions exhibiting improved development characteristics (e.g., resolution, development speed, contrast, shrinkage, etc.), improved etch resistance, and improved lithographic process window.
While a photoresist composition must possess desirable optical characteristics to enable image resolution at a desired radiation wavelength, the photoresist composition must also possess suitable chemical and mechanical properties to enable transfer to the image from the patterned photoresist to an underlying substrate layer(s).
The physical properties and especially the CTEs and elastic moduli of glass fabrics and the weaving characteristics of the fabric which control the volume fractions of glass in a fabric.
excellent shock absorbing characteristics